The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2007

Filed:

Feb. 15, 2002
Applicant:

Nobuo Ishii, Amagasaki, JP;

Inventor:

Nobuo Ishii, Amagasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma apparatus includes a container () having an opening, a dielectric member () supported by an end surface of an outer periphery of the opening of the container (), an electromagnetic field supplying means for supplying an electromagnetic field into the container () through the dielectric member (), and a shield member () covering the outer periphery of the dielectric member () and shielding the electromagnetic field. A distance Lfrom an inner surface of the container () to an inner surface of the shield member () at an end surface of the container () is approximately N/2 (N is an integer not smaller than 0) times the wavelength of the electromagnetic field in an area () surrounded by the end surface of the container (), the electromagnetic field supplying means and the shield member ().


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