The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Jul. 07, 2006
Hiroyuki Murayama, Kanagawa, JP;
Shuji Koyama, Kanagawa, JP;
Yoshinori Tagawa, Kanagawa, JP;
Kenji Fujii, Kanagawa, JP;
Masaki Ohsumi, Kanagawa, JP;
Yoshinobu Urayama, Kanagawa, JP;
Jun Yamamuro, Kanagawa, JP;
Tsuyoshi Takahashi, Kanagawa, JP;
Masahisa Watanabe, Kanagawa, JP;
Hiroyuki Murayama, Kanagawa, JP;
Shuji Koyama, Kanagawa, JP;
Yoshinori Tagawa, Kanagawa, JP;
Kenji Fujii, Kanagawa, JP;
Masaki Ohsumi, Kanagawa, JP;
Yoshinobu Urayama, Kanagawa, JP;
Jun Yamamuro, Kanagawa, JP;
Tsuyoshi Takahashi, Kanagawa, JP;
Masahisa Watanabe, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.