The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Apr. 15, 2005
Applicants:
Yasutaka Ozaki, Kawasaki, JP;
Tatsuya Yokota, Kawasaki, JP;
Nobutaka Ohyagi, Kawasaki, JP;
Inventors:
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A W plug () is formed and a W oxidation preventing barrier metal film () is formed thereon. After that, an SiON film () thinner than the W oxidation preventing barrier metal film () is formed and Ar sputter etching is performed on the SiON film (). As a result, the shape of the surface of the SiON film () becomes gentler and deep trenches disappear. Next, an SiON film () is formed on the whole surface. A voidless W oxidation preventing insulating film () is composed of the SiON () film and the SiON film ().