The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Dec. 01, 2003
Anthony Vesci, San Jose, CA (US);
Vince Kirchhoff, Morgan Hill, CA (US);
James Woodward, Sunnyvale, CA (US);
Kevin Hughes, San Jose, CA (US);
Mark Van Der Pyl, Menlo Park, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Evans Lee, Milpitas, CA (US);
Anthony Vesci, San Jose, CA (US);
Vince Kirchhoff, Morgan Hill, CA (US);
James Woodward, Sunnyvale, CA (US);
Kevin Hughes, San Jose, CA (US);
Mark van der Pyl, Menlo Park, CA (US);
Tetsuya Ishikawa, Saratoga, CA (US);
Evans Lee, Milpitas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A magnet assembly for a plasma process chamber has a hollow collar comprising a cross-section that is absent seams. The hollow collar has an open end face and a cap is provided to seal the open end face of the collar. A plurality of magnets are in the hollow collar, the magnets being insertable through the open end face. The collar is capable of being snap fitted onto the chamber wall. The magnet assembly can also comprise one or more of the collars such that the collars, when installed, form a substantially continuous ring about a chamber wall.