The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2007
Filed:
Jun. 08, 2005
Henrikus Herman Marie Cox, Eindhoven, NL;
Hernes Jacobs, Eindhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Petrus Matthijs Henricus Vosters, Bladel, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Hernes Jacobs, Eindhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Petrus Matthijs Henricus Vosters, Bladel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.