The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2007

Filed:

Jun. 09, 2004
Applicant:

Daniel Tran, San Jose, CA (US);

Inventor:

Daniel Tran, San Jose, CA (US);

Assignee:

n&k Technology Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B07C 1/18 (2006.01); B21B 39/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

A flipper for rotating and positioning a photomask in two flip orientations includes a flip unit rotatably held in a base. The flip unit includes a flip frame in which clamps are preferably spring loaded guided such that the clamps are oppositely and laterally displaceable between engaged positions and parking positions. A stepper motor rotates the flip unit between two flip orientations and positions the flip unit such that opposite inspection sides of the work piece are alternately oriented with respect to a single inspection direction. The flipper may be placed on or adjacent to a stage system of an inspection device. A robotically actuated effector may access the flipper for loading and unloading the work piece. In combination with an effector operating without lift motion, the clamps may feature wedge lift faces to lift the work piece off the effector during their actuation into engaged position.


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