The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Jan. 29, 2004
Markus Mengel, Heidenheim, DE;
Markus Mengel, Heidenheim, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method and an apparatus for the spatially resolved polarimetric examination of an imaging beam pencil () generated by an associated pulsed radiation source (). A first and a second photoelastic modulator () and a polarization element () are introduced serially into the beam path of the beam pencil. A control unit () activates a first modulation oscillation of the first photoelastic modulator and a second modulation oscillation of the second photoelastic modulator and drives the radiation source for outputting a respective radiation pulse in a manner dependent on the oscillation state of the first photoelastic modulator and/or the second photoelastic modulator. A detector () detects the beam pencil coming from the polarization element in a spatially resolved manner.