The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2007

Filed:

Jan. 25, 2005
Applicants:

Yen Ping Wang, Taipei, TW;

Chih Hao Wang, Hsinchu, TW;

Inventors:

Yen Ping Wang, Taipei, TW;

Chih Hao Wang, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/94 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor product and a method for fabricating the semiconductor product provide a pair of gate electrodes formed with respect to a pair of doped wells within a semiconductor substrate. One of the gate electrodes is formed of a first gate electrode material having a first concentration of an electrically active dopant therein. A second of the gate electrodes is formed of the first gate electrode material having less than the first concentration of the electrically active dopant therein, and formed at least partially as an alloy with a second gate electrode material. The semiconductor product may be formed with enhanced efficiency.


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