The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2007
Filed:
Dec. 16, 2004
John A. Woollam, Lincoln, NE (US);
Blaine D. Johs, Lincoln, NE (US);
Thomas E. Tiwald, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
James D. Welch, Omaha, NE (US);
John A. Woollam, Lincoln, NE (US);
Blaine D. Johs, Lincoln, NE (US);
Thomas E. Tiwald, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
James D. Welch, Omaha, NE (US);
J.A. Woollam Co., Inc., Lincoln, NE (US);
Abstract
Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative eat some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angle-of-Incidence (AOI) to monitor deposition of and/or removal of minute amounts of materials onto, or from, said process and/or witness substrate. The methodology can optionally monitor ellipsometric PSI, and involves simultaneously or sequentially applying non-P-polarized electromagnetism at the same angle of incidence, or electromagnetic radiation of any polarization at a different angle-of-incidence and wavelength to the process or wittness substrate and application of conventional ellipsometric analysis.