The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2007

Filed:

Jul. 24, 2003
Applicants:

Takashi Hoshino, Osaka, JP;

Shin Harada, Osaka, JP;

Kazuhiro Fujikawa, Osaka, JP;

Satoshi Hatsukawa, Osaka, JP;

Kenichi Hirotsu, Osaka, JP;

Inventors:

Takashi Hoshino, Osaka, JP;

Shin Harada, Osaka, JP;

Kazuhiro Fujikawa, Osaka, JP;

Satoshi Hatsukawa, Osaka, JP;

Kenichi Hirotsu, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vertical JFETaccording to the present invention has an ntype drain semiconductor portion, an n-type drift semiconductor portion, a ptype gate semiconductor portion, an n-type channel semiconductor portion, an ntype source semiconductor portion, and a ptype gate semiconductor portion. The n-type drift semiconductor portionis placed on a principal surface of the ntype drain semiconductor portionand has first to fourth regionstoextending in a direction intersecting with the principal surface. The ptype gate semiconductor portionis placed on the first to third regionstoof the n-type drift semiconductor portion. The n-type channel semiconductor portionis placed along the ptype gate semiconductor portionand is electrically connected to the fourth regionof the n-type drift semiconductor portion


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