The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Apr. 30, 2004
Jeffrey S. Lille, Sunnyvale, CA (US);
Son Van Nguyen, Los Gatos, CA (US);
Hugo Alberto Emilio Santini, San Jose, CA (US);
Jeffrey S. Lille, Sunnyvale, CA (US);
Son Van Nguyen, Los Gatos, CA (US);
Hugo Alberto Emilio Santini, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A a method for fabricating a structure, such as a magnetic head, having two coplanar metallic features of different compositions, both deposited on their own seed layers. The features may be made tall relative to their widths (ie. have a high aspect ratio), and are also very closely spaced. Only a single high-definition, critically aligned photolithographic procedure is used to create the critical structures, avoiding any problem with aligning features produced by multiple procedures. The method is applied to the production of the write structure of a magnetic read/write head, where a portion of the pole structure and the inductive coils are fabricated in the same plane with a close spacing and both having a vertical aspect ratio of more than about 2:1.