The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2007

Filed:

Jul. 02, 2004
Applicants:

Gerrit Johannes Nijmeijer, Eindhoven, NL;

Anastasius Jacobus Anicetus Bruinsma, Delft, NL;

Christiaan Alexander Hoogendam, Veldhoven, NL;

Jeroen Thomas Broekhuijse, Overpelt, NL;

Sigurd Dressler, Obertiefenbach, DE;

Edwin Eduard Nicolaas Josephus Krijnen, Oss, NL;

Robbert Edgar Van Leeuwen, Eindhoven, NL;

Roeland Nicolaas Maria Vanneer, Eindhoven, NL;

Cornelis Christiaan Ottens, Veldhoven, NL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.


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