The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
May. 26, 2005
Palash P. Das, Vista, CA (US);
Thomas Hofmann, San Diego, CA (US);
Otto Boucky, Heidenheim, DE;
Ernst Stump, Koenigsbronn, DE;
Berthold Matzkovits, Gerstetten, DE;
Michael Hoell, Aalen, DE;
Joerg Walther, Gerstetten, DE;
Kurt Brenner, Satteldorf, DE;
Guenter Grupp, Boehmenkirch, DE;
Palash P. Das, Vista, CA (US);
Thomas Hofmann, San Diego, CA (US);
Otto Boucky, Heidenheim, DE;
Ernst Stump, Koenigsbronn, DE;
Berthold Matzkovits, Gerstetten, DE;
Michael Hoell, Aalen, DE;
Joerg Walther, Gerstetten, DE;
Kurt Brenner, Satteldorf, DE;
Guenter Grupp, Boehmenkirch, DE;
Cymer, Inc., San Diego, CA (US);
Carl Zeiss Industrielle Messtechnik GmbH, Oberkochen, DE;
Abstract
Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the film on an image plane to determine whether the beam is focused in the short axis at the film. In still another aspect, a system may be provided for positioning a film (having an imperfect, non-planar surface) for interaction with a shaped line beam.