The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Sep. 01, 2004
Guenther Seitz, Spiegelberg, DE;
Wolfgang Otto, Aalen, DE;
Guenther Seitz, Spiegelberg, DE;
Wolfgang Otto, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
The method serves for the interferometric measurement of non-rotationally symmetric wavefront errors on a specimen . The specimen is brought into a number of rotational positions, at least one measurement result being determined in each of the rotational positions and a mathematical evaluation of all measurement results is performed. The measurement results (M. . . M; N. . . N) of each of the measurement series (M, N) are determined respectively in mutually equidistant rotational positions of the specimen . The measurement results (M. . . M, N. . . N) of each of the at least two measurement series (M, N) are evaluated independently of one another for non-rotationally symmetric wavefront errors (<W>, <W>) on the specimen, and a difference is computationally rotated m or n times and the results averaged out. At least one of the wavefront errors (<W>, <W>) is corrected with the result (<<W>-<W>>or <<W>-<W>>) averaged in this way.