The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Jun. 16, 2005
Rene Monshouwer, Eindhoven, NL;
Jacobus Hermanus Maria Neijzen, Eindhoven, NL;
Jan Evert Van Der Werf, Eindhoven, NL;
Rene Monshouwer, Eindhoven, NL;
Jacobus Hermanus Maria Neijzen, Eindhoven, NL;
Jan Evert Van Der Werf, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a method of measuring, in a lithographic manufacturing process using a lithographic projection apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a substrate, use is made of an alignment-measuring device forming part of the apparatus and of specific overlay marks in the substrate and resist layer. These marks have periodic structures with periods which cannot be resolved by the alignment device, but generate an interference pattern having a period corresponding to the period of a reference mark of the alignment device.