The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Jun. 27, 2003
William A. Stanton, Boise, ID (US);
Husayn Alvarez-gomariz, Meridian, ID (US);
William A. Stanton, Boise, ID (US);
Husayn Alvarez-Gomariz, Meridian, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Design methods and a computer-readable medium having computer-executable instructions thereon for sidelobe suppression in a radiation-patterning tool or mask. Sidelobe artifacts are mitigated by identifying elements as a function of the radiation wavelength for forming desired profiles on a semiconductor wafer. A diffraction ring is calculated around each of the elements to identify sidelobe interference zones and intesections of diffraction rings are located. When a guard ring around one of the intersections would otherwise overlap with a guard ring around another one of the intersections, a common sidelobe inhibitor is located at the common overlap region of the guard rings. A method for forming a mask with the addition of sidelobe inhibitors as well as a method for determining the location of placement of sidelobe inhibitors is also disclosed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile