The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2007
Filed:
May. 28, 2004
Steven E. Green, Lincoln, NE (US);
Ping He, Lincoln, NE (US);
Galen L. Pfeiffer, Lincoln, NE (US);
Brian D. Guenther, Lincoln, NE (US);
Gerald T. Cooney, Lincoln, NE (US);
John A. Woollam, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
Blaine D. Johs, Lincoln, NE (US);
Craig M. Herzinger, Lincoln, NE (US);
Steven E. Green, Lincoln, NE (US);
Ping He, Lincoln, NE (US);
Galen L. Pfeiffer, Lincoln, NE (US);
Brian D. Guenther, Lincoln, NE (US);
Gerald T. Cooney, Lincoln, NE (US);
John A. Woollam, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
Blaine D. Johs, Lincoln, NE (US);
Craig M. Herzinger, Lincoln, NE (US);
J.A. Woollam Co., Inc, Lincoln, NE (US);
Abstract
A sample sequestering system which allows access to a subspace in a chamber encompassed generally enclosed space, for use in entering and removing a sample when the subspace is opened to atmosphere. Sufficient purge gas is flowed from within the generally enclosed space into the subspace discourage atmospheric contaminates from entering into the subspace. Contained within the generally enclosed space is a spectrophotometer, ellipsometer or polarimeter or the like system which operates at wavelengths, (eg. UV), which are adversely affected, (eg. absorbed), by typical atmospheric contents.