The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2007

Filed:

Apr. 03, 2006
Applicants:

Pavel Adamec, Heimstetten, DE;

Ralf Degenhardt, Heimstetten, DE;

Hans-peter Feuerbaum, Heimstetten, DE;

Harry Munack, Heimstetten, DE;

Dieter Winkler, Heimstetten, DE;

Inventors:

Pavel Adamec, Heimstetten, DE;

Ralf Degenhardt, Heimstetten, DE;

Hans-Peter Feuerbaum, Heimstetten, DE;

Harry Munack, Heimstetten, DE;

Dieter Winkler, Heimstetten, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.


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