The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2007

Filed:

May. 26, 2005
Applicants:

Akimitsu Okura, Hitachinaka, JP;

Masashi Kimura, Tokai-mura, JP;

Kenichi Hirane, Hitachi, JP;

Yoshihiko Nakayama, Hitachinaka, JP;

Inventors:

Akimitsu Okura, Hitachinaka, JP;

Masashi Kimura, Tokai-mura, JP;

Kenichi Hirane, Hitachi, JP;

Yoshihiko Nakayama, Hitachinaka, JP;

Assignees:

Hitachi High-Technologies Corporation, Tokyo, JP;

Hitachi Science Systems, Ltd., Hitachinaka-shi, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.


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