The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
May. 22, 2006
Nicolas Alban Lallemant, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Marcel Beckers, Eindhoven, NL;
Ronald Stultiens, Veghel, NL;
Pascal Antonius Smits, Genderen, NL;
Wladimir Fransiscus Gerardus Maria Hertog, Velden, NL;
David Theodorus Willy Van Der Plas, Eindhoven, NL;
Stephan Koelink, Eindhoven, NL;
Henk Krus, Waalre, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Marcel Beckers, Eindhoven, NL;
Ronald Stultiens, Veghel, NL;
Pascal Antonius Smits, Genderen, NL;
Wladimir Fransiscus Gerardus Maria Hertog, Velden, NL;
David Theodorus Willy Van Der Plas, Eindhoven, NL;
Stephan Koelink, Eindhoven, NL;
Henk Krus, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.