The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Nov. 22, 2005
Youichi Nakayama, Nirasaki, JP;
Daisuke Morisawa, Nirasaki, JP;
Youichi Nakayama, Nirasaki, JP;
Daisuke Morisawa, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus, which includes a plurality of process chambers for processing a substrate and a transfer part for carrying in and carrying out the substrate to and from the plurality of process chambers, includes a transfer history recording part, a process history recording part, and an alarm history recording part. The transfer history recording part relates history information concerning a transfer of the substrate by the transfer part to each substrate, and records the history information as first history information. The process history recording part relates history information concerning a process state of the substrate in each of the plurality of process chambers to each substrate subject to be processed, and records the history information as second history information. The alarm history recording part relates history information concerning an alarm occurred in at least one of the transfer part and the process chambers to each substrate, and records the history information as third history information.