The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Jun. 30, 2006
Kazuhiko Hayashi, Tokyo, JP;
Junichi Fujikata, Tokyo, JP;
Tsutomu Ishi, Tokyo, JP;
Shigeru Mori, Tokyo, JP;
Keishi Ohashi, Tokyo, JP;
Masafumi Nakada, Tokyo, JP;
Kiyokazu Nagahara, Tokyo, JP;
Kunihiko Ishihara, Tokyo, JP;
Nobuyuki Ishiwata, Tokyo, JP;
Kazuhiko Hayashi, Tokyo, JP;
Junichi Fujikata, Tokyo, JP;
Tsutomu Ishi, Tokyo, JP;
Shigeru Mori, Tokyo, JP;
Keishi Ohashi, Tokyo, JP;
Masafumi Nakada, Tokyo, JP;
Kiyokazu Nagahara, Tokyo, JP;
Kunihiko Ishihara, Tokyo, JP;
Nobuyuki Ishiwata, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A magneto-resistance effect element is adapted that a non-magnetic layer (9, 18), a free layer (3, 19), another non-magnetic layer (4, 25), a fixed layer (5, 26), and a fixing layer (6, 27) are formed vertically symmetric with respect to a first magnetic layer (8), to which a vertical bias magnetic field is applied from an underlying layer (2) for a vertical bias layer (2). The magneto-resistance effect element operates in CPP mode. Generally, the free layer is unavoidably subjected to the influence of a circular electric magnetic field caused by a current flowing perpendicularly to the film surface. However, in the magneto-resistance effect element, the influence of the electric magnetic field to which the free layer (3) is subjected is opposite to that of the electric magnetic field to which the second free layer (19) is subjected, thereby canceling out the influences as a hole.