The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7265815 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 04, 2007

Filed:

May. 19, 2005
Applicant:

Pradeep K. Govil, Norwalk, CT (US);

Inventor:

Pradeep K. Govil, Norwalk, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/80 (2006.01); G03B 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system are used to control a characteristic of a beam. The system comprises an illumination system, at least one optical element, a fluid source, and a pressure and/or fluid concentration controller. The illumination system produces a beam of radiation. The at least one optical element has at least one fluid path therethrough through which the beam passes and is capable of changing a characteristic of one or more portions of the beam. The fluid source supplies fluid to the at least one fluid path. The pressure and/or fluid concentration controller controls pressure and/or fluid concentration of the fluid to change the characteristic of the beam, which is positioned between the fluid source and the optical element.


Find Patent Forward Citations

Loading…