The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Oct. 31, 2005
Applicants:
Bruno Ghyselen, Seyssinet-Pariset, FR;
Takeshi Akatsu, Saint Nazaire les Eymes, FR;
Inventors:
Bruno Ghyselen, Seyssinet-Pariset, FR;
Takeshi Akatsu, Saint Nazaire les Eymes, FR;
Assignee:
S.O.I.Tec Silicon on Insulator Technologies, Bernin, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/288 (2006.01); H01L 21/425 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for implanting atomic species through an uneven surface of a semiconductor layer. The technique includes applying a covering layer upon the uneven surface in an amount sufficient and in a manner to increase surface uniformity. The method also includes implanting atomic species through the covering layer and uneven surface to obtain a more uniform depth of implantation of the atomic species in the layer.