The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Mar. 24, 2004
Kotaro Endo, Kanagawa, JP;
Masaaki Yoshida, Kanagawa, JP;
Taku Hirayama, Kanagawa, JP;
Hiromitsu Tsuji, Kanagawa, JP;
Toshiyuki Ogata, Kanagawa, JP;
Mitsuru Sato, Kanagawa, JP;
Kotaro Endo, Kanagawa, JP;
Masaaki Yoshida, Kanagawa, JP;
Taku Hirayama, Kanagawa, JP;
Hiromitsu Tsuji, Kanagawa, JP;
Toshiyuki Ogata, Kanagawa, JP;
Mitsuru Sato, Kanagawa, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.