The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
Oct. 06, 2004
David James Crain, Grabill, IN (US);
Douglas L. Cohen, Fort Wayne, IN (US);
David James Crain, Grabill, IN (US);
Douglas L. Cohen, Fort Wayne, IN (US);
ITT Manufacturing Enterprises, Inc., Wilmington, DE (US);
Abstract
A method for measuring scene inhomogeneity includes directing radiance of a scene into an interferometer; and oscillating a field-of-view (FOV) of the interferometer, while directing the radiance of the scene into the interferometer. A Fourier transform of signals emerging from the interferometer is obtained with magnitude values of the Fourier transform as a function of wavelength. The magnitude values are separated into (1) component values occurring within a predetermined wavelength band of the interferometer and (2) a component value occurring outside the predetermined wavelength band. The component value occurring outside the predetermined wavelength band is used to measure scene inhomogeneity.