The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
Jul. 26, 2005
Applicants:
Shine Chien Chung, Taipei Hsien, TW;
David LU, Hsinchu, TW;
Inventors:
Shine Chien Chung, Taipei Hsien, TW;
David Lu, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Hsin-Chu, TW;
Primary Examiner:
Int. Cl.
CPC ...
H01L 32/58 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A circuit and method are disclosed for reducing device mismatch due to trench isolation related stress. One or more extended active regions are formed on the substrate, wherein the active regions being extended from one or more ends thereof, and one or more operational devices are placed on one or more active regions, wherein the extended active region has at least a length twice as much as a distance between gates of two neighboring operational devices.