The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Dec. 09, 2004
Robert J. Allen, Jericho, VT (US);
Cam V. Endicott, Essex Junction, VT (US);
Fook-luen Heng, Yorktown Heights, NY (US);
Jason D. Hibbeler, Williston, VT (US);
Kevin W. Mccullen, Essex Junction, VT (US);
Rani Narayan, San Jose, CA (US);
Robert F. Walker, St. George, VT (US);
Xin Yuan, Essex Junction, VT (US);
Robert J. Allen, Jericho, VT (US);
Cam V. Endicott, Essex Junction, VT (US);
Fook-Luen Heng, Yorktown Heights, NY (US);
Jason D. Hibbeler, Williston, VT (US);
Kevin W. McCullen, Essex Junction, VT (US);
Rani Narayan, San Jose, CA (US);
Robert F. Walker, St. George, VT (US);
Xin Yuan, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.