The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Dec. 22, 2004
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Petrus Matthijs Henricus Vosters, Bladel, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Petrus Matthijs Henricus Vosters, Bladel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.