The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2007

Filed:

Jan. 21, 2005
Applicants:

Sang-kee Eah, Darien, IL (US);

Xiao-min Lin, Naperville, IL (US);

Gary Wiederrecht, Elmhurst, IL (US);

Inventors:

Sang-Kee Eah, Darien, IL (US);

Xiao-Min Lin, Naperville, IL (US);

Gary Wiederrecht, Elmhurst, IL (US);

Assignee:

UChicago Argonne LLC, Chicago, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An interferometer and a method for generating scattered light interference are provided. A beam splitter is provided by a single metal nanoparticle to split an incoming excitation light. Scattered light from the single metal nanoparticle and its mirror image shows interference in both spatial and spectral domains. A mirror modifies the spatial distribution of elastic light scattering of the single metal nanoparticle. A large spectral width of the scattered light enables a distance measurement without scanning the mirror.


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