The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2007
Filed:
Sep. 20, 2005
Khoon Peng Lim, Singapore, SG;
Lai Seng Foo, Singapore, SG;
Khoon Peng Lim, Singapore, SG;
Lai Seng Foo, Singapore, SG;
TECH Semiconductor Singapore Pte Ltd, Singapore, SG;
Abstract
An apparatus and method for use is described which permits real time monitoring of build-up of particulate contamination in a wafer processing chamber. The apparatus is capable of monitoring particle build up in regions of a processing chamber which are not accessible by traditional optical particle scanners. An accelerometer is fastened to a body in the chamber upon which particulates deposit. The body is subjected to vibrations and produces a vibration signal which is detected by the accelerometer. The signal is processed to form a frequency spectrum of vibration amplitudes. Frequencies in a selected band are directly proportional to the particulate build up on the body. The invention is applied to a wafer annealing tool with a rotatable platform wherein particles deposit on a support body under the wafer. The method and apparatus have been shown to be reliable and accurate as well as cost effective and easily implemented.