The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2007
Filed:
Nov. 15, 2002
Applicants:
Masaru Ohta, Tokyo, JP;
Atsushi Ito, Tokyo, JP;
Isamu Mochizuki, Tokyo, JP;
Katsumi Inomata, Tokyo, JP;
Shin-ichiro Iwanaga, Tokyo, JP;
Inventors:
Masaru Ohta, Tokyo, JP;
Atsushi Ito, Tokyo, JP;
Isamu Mochizuki, Tokyo, JP;
Katsumi Inomata, Tokyo, JP;
Shin-ichiro Iwanaga, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. The method comprises the steps of: