The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2007
Filed:
Jan. 18, 2007
Sergei V. Govorkov, Boca Raton, FL (US);
Gongxue Hua, Coral Springs, FL (US);
Timur Misuryaev, Coral Springs, FL (US);
Alexander O. Wiessner, Goettingen, DE;
Thomas Schmidt, Goettingen, DE;
Rainer Paetzel, Dransfeld, DE;
Sergei V. Govorkov, Boca Raton, FL (US);
Gongxue Hua, Coral Springs, FL (US);
Timur Misuryaev, Coral Springs, FL (US);
Alexander O. Wiessner, Goettingen, DE;
Thomas Schmidt, Goettingen, DE;
Rainer Paetzel, Dransfeld, DE;
Lambda Physik AG, Goettingen, DE;
Abstract
The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be 'stretched' in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.