The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
May. 28, 2003
Koji Egashira, Tosu, JP;
Koji Egashira, Tosu, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
A substrate processing apparatus includes a rotorfor rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor, a chemical liquid is supplied to the wafers W for their processing. The rotorhas holding membersfor holding the peripheries of the wafers W in parallel arrangement and a press memberfor holding the wafers W while applying a pressure on their peripheries. Irrespective of rotation of the rotor, the press memberalways applies a pressure on the peripheries of the wafers W so as to prevent the peripheries from sifting with respect to the holding members. With the action of the press member, it becomes possible to prevent the peripheries of the wafers W from being worn and also possible to elongate the span of life of the holding memberswhile performing a chemical processing.