The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Mar. 10, 2004
Shiho Okuno, Kanagawa-ken, JP;
Yuichi Ohsawa, Kanagawa-ken, JP;
Shigeru Haneda, Kanagawa-ken, JP;
Yuzo Kamiguchi, Kanagawa-ken, JP;
Tatsuya Kishi, Kanagawa-ken, JP;
Shiho Okuno, Kanagawa-ken, JP;
Yuichi Ohsawa, Kanagawa-ken, JP;
Shigeru Haneda, Kanagawa-ken, JP;
Yuzo Kamiguchi, Kanagawa-ken, JP;
Tatsuya Kishi, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of manufacturing a magnetoresistance effect element includes forming an insulating layer on a first ferromagnetic layer, forming an aperture reaching the first ferromagnetic layer by thrusting a needle from the top surface of the insulating layer, and depositing a ferromagnetic material to form a second ferromagnetic layer overlying the insulating layer which buries the aperture. The aperture can have an opening width not larger than 20 nm. A current flowing between the first ferromagnetic layer and the needle can be monitored, and thrusting of the needle can be interrupted when the current reaches a predetermined value.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile