The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Sep. 17, 2003
Applicants:
Tatsuya Sakai, Tokyo, JP;
Sachiko Hashimoto, Tokyo, JP;
Yasuo Matsuki, Tokyo, JP;
Inventors:
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07F 17/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example
Sakai, Tatsuya. (2007). Ruthenium compound and process for producing a metal ruthenium film (U.S. Patent No. 7238822). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7238822
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile