The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Nov. 26, 2003
Geun Su Lee, Gyeonggi-do, KR;
Cheol Kyu Bok, Seoul, KR;
Young Sun Hwang, Gyeonggi-do, KR;
Sung Koo Lee, Seoul, KR;
Seung Chan Moon, Gyeonggi-do, KR;
Ki Soo Shin, Gyeonggi-do, KR;
Geun Su Lee, Gyeonggi-do, KR;
Cheol Kyu Bok, Seoul, KR;
Young Sun Hwang, Gyeonggi-do, KR;
Sung Koo Lee, Seoul, KR;
Seung Chan Moon, Gyeonggi-do, KR;
Ki Soo Shin, Gyeonggi-do, KR;
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Abstract
Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises HO as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation.