The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Nov. 03, 2006
Applicants:
Steven Naugler, Hockessin, DE (US);
Steven J. Pufka, Pennsville, NJ (US);
Jeffrey R. Stack, Clayton, DE (US);
Weitung Wang, Newark, DE (US);
Inventors:
Steven Naugler, Hockessin, DE (US);
Steven J. Pufka, Pennsville, NJ (US);
Jeffrey R. Stack, Clayton, DE (US);
Weitung Wang, Newark, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23C 3/00 (2006.01); B23P 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is provided for forming grooves in a polishing pad useful for planarizing a substrate in a chemical mechanical planarization process. The method maintains average velocity as a function of bit diameter to enable groove formation using a rotating bit, whereby grooves can be formed at a higher rate while maintaining high groove quality and low defectivity.