The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2007
Filed:
Sep. 16, 2004
Hanzhong Zhang, Cupertino, CA (US);
Feng Liu, San Jose, CA (US);
Stan Tsai, Fremont, CA (US);
Rashid Mavliev, Campbell, CA (US);
Donald Olgado, Palo Alto, CA (US);
Liang-yuh Chen, Foster City, CA (US);
Hanzhong Zhang, Cupertino, CA (US);
Feng Liu, San Jose, CA (US);
Stan Tsai, Fremont, CA (US);
Rashid Mavliev, Campbell, CA (US);
Donald Olgado, Palo Alto, CA (US);
Liang-Yuh Chen, Foster City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate polishing apparatus and method are described. A base includes at least one movable platen to engage a polishing pad. At least one carrier head assembly presses a substrate against the polishing pad substantially within a polishing area during a polishing operation. A polishing solution dispenser applies a polishing solution to the polishing pad substantially within the polishing area during the polishing operation. A polishing solution retaining mechanism is attached to one of the base or the carrier head assembly. The retaining mechanism engages a top surface of the polishing pad and retains the polishing solution substantially within the polishing area during the polishing operation. Some implementations may reduce polishing solution consumption and allow for increased angular velocity.