The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Aug. 25, 2004
Applicant:
Joerg Bruebach, Eindhoven, NL;
Inventor:
Joerg Bruebach, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus includes an illumination system for conditioning a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus includes an illumination system having an adjustable filter for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. Embodiments of the apparatus provide reproduction of both isolated and dense features patterned on the mask.