The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Mar. 13, 2006
Mark Kroon, Utrecht, NL;
Michael Cornelis Van Beek, Eindhoven, NL;
Peter Dirksen, Valkenswaard, NL;
Ralph Kurt, Eindhoven, DE;
Cassandra May Owen, Chandler, AZ (US);
Mark Kroon, Utrecht, NL;
Michael Cornelis Van Beek, Eindhoven, NL;
Peter Dirksen, Valkenswaard, NL;
Ralph Kurt, Eindhoven, DE;
Cassandra May Owen, Chandler, AZ (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.