The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Mar. 24, 2006
Steffen Lauer, Aalen, DE;
Ulrich Wegmann, Koenigsbrunn, DE;
Wolfgang Emer, Aalen, DE;
Harald Sakowski, Lauchheim, DE;
Martin Schriever, Aalen, DE;
Steffen Lauer, Aalen, DE;
Ulrich Wegmann, Koenigsbrunn, DE;
Wolfgang Emer, Aalen, DE;
Harald Sakowski, Lauchheim, DE;
Martin Schriever, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ) and a second wavelength (λ), wherein a first ratio is defined as an intensity of light λto an intensity of light λin the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λto the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λto an intensity of light of λin the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.