The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
May. 03, 2004
Colin J. Brodsky, Salt Point, NY (US);
Scott J. Bukofsky, Hopewell Junction, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Scott D. Halle, Hopewell Junction, NY (US);
Colin J. Brodsky, Salt Point, NY (US);
Scott J. Bukofsky, Hopewell Junction, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Scott D. Halle, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for preparing a substrate for photolithographic patterning. The method includes providing a substrate having at least an exposed rough surface layer including a polymeric material. The rough surface layer has surface features characterized by feature step height varying between about two percent and twenty percent of the minimum photolithographic half-pitch. A layer of photoresist material is then provided over the exposed rough surface layer and patterned.