The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2007

Filed:

Sep. 30, 2002
Applicants:

Cory E. Weber, Hillsboro, OR (US);

Gerhard Schrom, Hillsboro, OR (US);

Ian R. Post, Portland, OR (US);

Mark A. Stettler, Hillsboro, OR (US);

Inventors:

Cory E. Weber, Hillsboro, OR (US);

Gerhard Schrom, Hillsboro, OR (US);

Ian R. Post, Portland, OR (US);

Mark A. Stettler, Hillsboro, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 31/119 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method including forming a transistor device having a channel region; implanting a first halo into the channel region; and implanting a second different halo into the channel region. An apparatus including a gate electrode formed on a substrate; a channel region formed in the substrate below the gate electrode and between contact points; a first halo implant comprising a first species in the channel region; and a second halo implant including a different second species in the channel region.


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