The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
Jan. 26, 2006
Chien-chang Huang, Kueishan, TW;
Tie-jiang Wu, Kueishan, TW;
Chin-ling Huang, Kueishan, TW;
Yu-wei Ting, Kueishan, TW;
Bo-ching Jiang, Kueishan, TW;
Chien-Chang Huang, Kueishan, TW;
Tie-Jiang Wu, Kueishan, TW;
Chin-Ling Huang, Kueishan, TW;
Yu-Wei Ting, Kueishan, TW;
Bo-Ching Jiang, Kueishan, TW;
Nanya Technology Corporation, Kueishan Taoyuan, TW;
Abstract
A test structure and a test method for determining misalignment occurring in integrated circuit manufacturing processes are provided. The test structure includes a first conductive layer having a first testing structure and a second testing structure, a dielectric layer thereon, and a second conductive layer on the dielectric layer. The second conductive layer includes a third testing structure and a fourth testing structure, which respectively overlap a portion of the first testing structure and the second testing structure in a first direction and a second direction. The first direction is opposite to the second direction. The method includes a step of measuring the electrical characteristic between the first and the second conductive layers to calculate an offset amount caused by the misalignment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile