The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
May. 16, 2003
Applicant:
Yi Ding, Sunnyvale, CA (US);
Inventor:
Yi Ding, Sunnyvale, CA (US);
Assignee:
ProMOS Technologies Inc., Hsin Chu, TW;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract
A widened contact area (X) of a conductive feature () is formed by means of self-alignment between an edge (E) of the conductive feature and an edge (E) of another feature (). The other feature ('first feature') is formed from a first layer, and the conductive feature is formed from a second layer overlying the first layer. The edge (E) of the conductive feature is shaped to provide a widened contact area. This shaping is achieved in a self-aligned manner by shaping the corresponding edge (E) of the first feature.