The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
Sep. 25, 2002
Ryuji Kono, Annaka, JP;
Shoichi Takamizawa, Annaka, JP;
Ryuji Kono, Annaka, JP;
Shoichi Takamizawa, Annaka, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Abstract
A silicon single crystal wafer process apparatus () having: a process chamber (); a susceptor () which is disposed in the process chamber (), and on an upper surface of which the silicon single crystal wafer () is placed; and a lift pin () which is provided to be capable of a going up and down operation with respect to the susceptor (), for attaching or detaching the silicon single crystal wafer () to or from the susceptor () with the going up and down operation, in a state to support the silicon single crystal wafer () from a lower surface side, wherein the lift pin () is subjected to polishing on a contact end surface () which contacts with a rear surface of the silicon single crystal wafer ().