The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Nov. 18, 2004
Applicants:
Takaho Yoshida, Higashimatsuyama, JP;
Takeshi Kawasaki, Tokyo, JP;
Inventors:
Takaho Yoshida, Higashimatsuyama, JP;
Takeshi Kawasaki, Tokyo, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01); G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus. An intermediate potential region different from the ground potential of an aberration corrector is provided in the space between the stages of multipole lenses constructing the aberration corrector to adjust a potential. Using this, when selecting an incident (outgoing) condition, an outgoing (incident) condition can be adjusted.