The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Apr. 19, 2002
Kenichi Motoyama, Chiba, JP;
Takakazu Nakada, Tokyo, JP;
Hitoshi Furusho, Tokyo, JP;
Hiroyoshi Fukuro, Chiba, JP;
Kenichi Motoyama, Chiba, JP;
Takakazu Nakada, Tokyo, JP;
Hitoshi Furusho, Tokyo, JP;
Hiroyoshi Fukuro, Chiba, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si (OR)and/or a silicon compound (B) represented by RSi (OR)(wherein n is an integer of from 1 to 3), an alcohol (C) represented by RCHOH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600° C., and such a coating film having a film thickness of from 0.5 to 5 μm, a coating fluid to be used for such a coating film, and a process for producing such a coating fluid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile