The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Oct. 18, 2004
Michael Rennie, Mechanicsville, VA (US);
Jon Davis, Pudong, Shanghai 201204, CN;
Robert Fuller, Mechanicsville, VA (US);
Franz Hagl, 85290 Ilmendorf, DE;
Michael Rennie, Mechanicsville, VA (US);
Jon Davis, Pudong, Shanghai 201204, CN;
Robert Fuller, Mechanicsville, VA (US);
Franz Hagl, 85290 Ilmendorf, DE;
Other;
Abstract
An edge protection process for semiconductor device fabrication includes forming a protective layer on the circumferential edge region of a semiconductor substrate. The semiconductor substrate is placed in a plasma atmosphere and trench structures, such as deep trenches and shallow trench isolation structures are etched in the substrate. The protective layer substantially prevents the etching of the circumferential edge region, such that the formation of black silicon is substantially minimized during the etching process.